Photoreactive Polymers: The Science and Technology of Resists by Arnost Reiser
- Publisher: Wiley-Interscience (February 1989)
- Paperback: 409 pages ISBN-10:
- ISBN-10: 0471855502 ISBN-13:
- Language: English
Basic mechanisms and applications of photoresist chemistry in semiconductor device manufacturing, lithography, chemical engineering, and the graphic arts are discussed in this book. It gives a balanced view of the subject as it now stands and at the same time promotes an understanding of the perennial challenge of material science to meet the demands of new technology by the successful design of new materials. The presentation of the text follows the history of the subject, and the generic resist systems are described approximately in the order in which they made their appearance. This approach maintains the logic of technical development where a new material emerges in response to some deficiency in its historic precursor. The chapters dealing with the resists are interspersed with sections on the related background in photophysics, radiation chemistry, and image science. The text will be of benefit to engineers, chemists and materials scientists in the semiconductor, graphic arts, and polymer photography industries, and graduate students in chemical engineering and electronics.
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